Air Liquide Electronics today announced the successful completion of a series of expansions at its ALOHA™ manufacturing sites in California, United States, Chalon, France, and Tsukuba, Japan.
These expansions enable Air Liquide to double its production capacity of advanced precursors and bring multiple products online.
The USA facility in Fremont, set up in 2006 to support mass production of the ALOHATM family of precursors, has doubled its production floor area, including a new laboratory dedicated to joint development projects with customers and technology providers aimed at developing and scaling up next generation, enabling advanced deposition materials.
Similarly, the Europe and Japan based ALOHA™ facilities have completed expansions focused on increasing capacities in key products the industry relies on.
As semiconductor manufacturing is well into nanoscale levels, Air Liquide’s precursor technology has helped increase the electrical and mechanical performance of film materials used in microelectronics fabrication, accelerating a variety of emerging applications.
The range of highly engineered precursors currently ramping up at ALOHA™ facilities include:
Francisco Martins, vice president of Air Liquide Electronics said, “Air Liquide’s strong investment in advanced and differentiated products to meet cutting-edge semiconductor technologies is paying off. Our ALOHA family is playing an increasingly important role in the technology ecosystem and we are committed to supporting and growing with technology providers globally. The additional capacity and the next generation products in the pipeline will enable our customers to meet their technology roadmap challenges.”