ALOHA™ Advanced Precursors [ Return towards Semiconductors ]
The ALOHA product line includes all the advanced CVD and ALD precursors for sub-130 nm, with capabilities ranging from ton-level of low-k materials down to few grams of sub-45 nm R&D products.
ALOHA’s precursors come in a comprehensive package including dedicated, OEM-qualified delivery systems, ultra-high purity canisters, and extremely tight specifications, backed by its world class Air Liquide-BALAZS analytical expertise.ALOHA also has some proprietary process solutions, such as AHEAD or TSA for the deposition of Low Temperature silicon nitride, TDEAA as a non-pyrophoric TMA substitute, or ToRuS for C-free, high adhesion Ru ALD.
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